| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ab821ba3735303f67f53e8ca3883234a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5dbe68441251ac282a5a431aa643e43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6579f61638632967c26cf21ea3750a26 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2010-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3de8c210baebf4045c483fb275504d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a42087e01b0f88fc91a8c1224b33b94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_267d30113b29733bac61646c33beeb1a |
| publicationDate |
2018-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9958780-B2 |
| titleOfInvention |
Coating compositions for photoresists |
| abstract |
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing. |
| priorityDate |
2006-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |