| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_82a9e22a923eca64a02a97f0dfb493ed |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
2016-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ac3be19473dbdf54f13d43fc32803da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4752079ee4e5886e5ea49e3be627a4a8 |
| publicationDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9941377-B2 |
| titleOfInvention |
Semiconductor devices with wider field gates for reduced gate resistance |
| abstract |
Semiconductor devices with wider field gates for reduced gate resistance are disclosed. In one aspect, a semiconductor device is provided that employs a gate. The gate is a conductive line disposed above the semiconductor device to form transistors corresponding to active semiconductor regions. Each active semiconductor region has a corresponding channel region. Portions of the gate disposed over each channel region are active gates, and portions not disposed over the channel region, but that are disposed over field oxide regions, are field gates. A voltage differential between each active gate and a source of each corresponding transistor causes current flow in a channel region when the voltage differential exceeds a threshold voltage. The width of each field gate is a larger width than each active gate. The larger width of the field gates results in reduced gate resistance compared to devices with narrower field gates. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019304898-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10770391-B2 |
| priorityDate |
2015-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |