| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76879
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48 |
| filingDate |
2014-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_056655c06b0652a96a033c1ba21fc818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af6bf8eb778684259719b6b00ca323c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a94437540c85c3fc55946d1e82351b93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77179ca8f4de346e768622789a34fe16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d5e3874c60839c72f8f6620096ea815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abd479e1a7f8574d0cf755cf5ed0e85e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f9c0fad56061cfa609480b42a4dcb49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97841a22e58371b52f24d5d96a316340 |
| publicationDate |
2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9932671-B2 |
| titleOfInvention |
Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD) |
| abstract |
Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD) is described. In an example, a method of fabricating a thin metal film involves introducing precursor molecules proximate to a surface on or above a substrate, each of the precursor molecules having one or more metal centers surrounded by ligands. The method also involves depositing a metal layer on the surface by dissociating the ligands from the precursor molecules using a photo-assisted process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11081389-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11459347-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11760768-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11434254-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11390638-B1 |
| priorityDate |
2014-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |