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filingDate 2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9929241-B2
titleOfInvention Semiconductor device structure for improved performance and related method
abstract A semiconductor device includes a vertical gate electrode in a gate trench in a semiconductor substrate, and a lateral gate electrode over the semiconductor substrate and adjacent the gate trench, where the lateral gate electrode results in improved electrical performance of the semiconductor device. The improved electrical performance includes an improved avalanche current tolerance in the semiconductor device. The improved electrical performance includes a reduced impact ionization under the gate trench. The improved electrical performance includes a reduced electric field under the gate trench. The lateral gate electrode results in an improved thermal stability in the semiconductor device.
priorityDate 2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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