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filingDate 2016-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efcf2af4c02d976b173bf0826dda846d
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publicationDate 2018-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9923099-B2
titleOfInvention TFT with oxide layer on IGZO semiconductor active layer
abstract A method for manufacturing a thin-film transistor (TFT) is provided, including the following steps. A gate is formed on a substrate. A gate insulating layer is formed on the gate. A patterned semiconductor layer is formed on the gate insulating layer. A source is formed on the patterned semiconductor layer. The peripheral portion of the source is oxidized to form an oxide layer, wherein the oxide layer covers the source and a portion of the patterned semiconductor layer. A protective layer and hydrogen ions are formed, wherein the protective layer covers the oxide layer and the patterned semiconductor layer. The patterned semiconductor layer not covered by the oxide layer is doped with the hydrogen ions to form a drain. A TFT is also provided.
priorityDate 2014-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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