| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_35055756864d9ac4f2e80d042f2674d0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12 |
| filingDate |
2016-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f990e9afd2969fb39b83d99247360aa4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5db1d0d8a622f658a1e505f001a9597
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cb101e08d2cd139980fbf62bcc8b2cf |
| publicationDate |
2018-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9920023-B2 |
| titleOfInvention |
Leveling composition and method for electrodeposition of metals in microelectronics |
| abstract |
The present disclosure relates to a leveling composition for electrodepositing metals. The composition comprises a compound of formula (I): |
| priorityDate |
2013-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |