Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10056 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
filingDate |
2016-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_626b41236958902519cf6808bb7c5e7f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d71355054fb8e9913a8436150158daa6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d10dab2dbd666732a50c634c1590b12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0477ddbe8b750f2019de9b32618763f6 |
publicationDate |
2018-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9870612-B2 |
titleOfInvention |
Method for repairing a mask |
abstract |
A method includes inspecting a mask to locate a defect region for a defect of the mask. A phase distribution of an aerial image of the defect region is acquired. A point spread function of an imaging system is determined. One or more repair regions of the mask are identified based on the phase distribution of the aerial image of the defect region and the point spread function. A repair process is performed to the one or more repair regions of the mask to form one or more repair features. |
priorityDate |
2016-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |