| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G16-0237
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G12-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-23 |
| filingDate |
2015-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_806fc06a96c2a67ffd8e1896f36c8136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cddf25a8e58f6a7bfecf3af41c6bfa8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4bf185986fde805523d34a300d86cc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a840e12c0b0384319a0dd90dc7d7c4a8 |
| publicationDate |
2018-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9862802-B2 |
| titleOfInvention |
Poly(thioaminal) probe based lithography |
| abstract |
Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10702610-B2 |
| priorityDate |
2015-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |