http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9856574-B2

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-413
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-413
filingDate 2016-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12c53e3f117651c808e89ed8778bf9d9
publicationDate 2018-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9856574-B2
titleOfInvention Monitoring leveler concentrations in electroplating solutions
abstract Provided herein are methods and apparatus for determining leveler concentration in an electroplating solution. The approach allows the concentration of leveler to be detected and measured, even at very low leveler concentrations. According to the various embodiments, the methods involve providing an electrode with a metal surface, exposing the electrode to a pre-acceleration solution with at least one accelerator, allowing the surface of the electrode to become saturated with accelerator, measuring an electrochemical response while plating the electrode in a solution, and determining the concentration of leveler in the solution by comparing the measured electrochemical response to a model relating leveler concentration to known electrochemical responses. According to other embodiments, the apparatus includes an electrode, a measuring apparatus or an electrochemical cell configured to measure an electrochemical response, and a controller designed to carry out the method outlined above.
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priorityDate 2011-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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