| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5e4671b3ba1fd59502c47747a80896 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-005 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01G3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06 |
| filingDate |
2014-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cabc02d80f8d98f83df50ae5a60c2ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_109ed1335f56424d4461f88b187a04e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b6f3a7f53233118cde04c335bdaf334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a03356f283118fe749bb2206f78873ed |
| publicationDate |
2017-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9832853-B2 |
| titleOfInvention |
Alignment of light source focus |
| abstract |
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019101831-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10969690-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11340531-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11467498-B2 |
| priorityDate |
2010-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |