| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00396
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate |
2017-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2cd5b9ab2ab5f3908efd88ca04302b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c10401ceba6fccfadf43ab3dba199ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7395926091deff23481fbabf4c768a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d93f6988461c40d68f62d9eaa0d65b21 |
| publicationDate |
2017-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9810980-B1 |
| titleOfInvention |
Graphoepitaxy directed self assembly |
| abstract |
Graphoepitaxy directed self-assembly methods generally include grafting a conformal layer of a polymer brush onto a topographic substrate. A planarization material, which functions as a sacrificial material is coated onto the topographic substrate. The planarization material is etched back to a top surface of the topographic substrate, wherein the etch back removes the polymer brush from the top surfaces of the topographic substrate. The remaining portion of the polymer brush is protected by the remaining planarization material below the top surface of the topographic substrate, which can be removed with a solvent to provide the topographic substrate with a conformal polymer brush below the top surface of the topographic substrate. The substrate is then coated with a block copolymer and annealed to direct self-assembly of the block copolymer. The methods mitigate island and/or hole defect formation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019171188-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2585586-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2585586-B |
| priorityDate |
2016-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |