| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate |
2014-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41f50c9308f1dcf204a16f7025b51850
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcbfd86d4f6ecb20ec006c30b30ffe12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78e08906f4cf6a1a02c756f43948f2c6 |
| publicationDate |
2017-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9798240-B2 |
| titleOfInvention |
Controlling photo acid diffusion in lithography processes |
| abstract |
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field, a magnetic field, and/or a standing wave during photolithography processes. The field and/or standing wave application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11650506-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11003080-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11429026-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10048589-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10795262-B2 |
| priorityDate |
2014-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |