| abstract |
A refractory object can include at least 10 wt % Al 2 O 3 . Further, the refractory object may contain less than approximately 6 wt % SiO 2 or may include a dopant that includes an oxide of Ti, Mg, Ta, Nb, or any combination thereof. In an embodiment, at least approximately 1% of the Al 2 O 3 in the refractory object can be provided as reactive Al 2 O 3 . In another embodiment, the refractory object may have a density of at least approximately 3.55 g/cc, a corrosion rate of no greater than approximately 2.69 mm/year, or any combination of the foregoing. In a particular embodiment, the refractory object can be used to form an Al—Si—Mg glass sheet. In an embodiment, the refractory object may be formed by a process using a compound of Ti, Mg, Ta, Nb, or any combination thereof. |