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filingDate 2015-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9776279-B2
titleOfInvention Laser crystallization of thin films on various substrates at low temperatures
abstract A method and system are provided for crystallizing thin films with a laser system. The method includes obtaining a thin film comprising a substrate and a target layer that contains nano-scale particles and is deposited on the substrate. The heat conduction between the target layer and the substrate of the thin film is determined based on thermal input from the laser system to identify operating parameters for the laser system that cause crystallization of the nano-scale particles of the target layer in an environment at near room temperature with the substrate remaining at a temperature below the temperature of the target layer. The laser system is then operated with the determined operating parameters to generate a laser beam that is transmitted along an optical path to impinge the target layer. The laser beam is pulsed to create a localized rapid heating and cooling of the target layer.
priorityDate 2010-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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