http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9766170-B2
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2203-0286 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2203-0218 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N3-42 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N3-42 |
filingDate | 2015-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2017-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e04148789a1f6c50492f8bda70bfb9e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44e7fc2d25106ef39f32d3cb22f8cf87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_706c9fcf9c214b5c493433bd043285ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08b8298b693ce88201ccee7eb22a6228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f64af5a16690a4cda17ce70e7d82a97 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d070f681972ecb59ff60deee16bab1b |
publicationDate | 2017-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-9766170-B2 |
titleOfInvention | Determination of young'S modulus of porous thin films using ultra-low load nano-indentation |
abstract | A method and computer product program for determining Young's modulus. The method includes placing a probe in contact with a surface of a material on a substrate and, with an initial force of 800 nano newtons or less; determining the location of the surface relative to an initial indentation depth for the initial force; increasing the force on the probe from the initial force to a maximum force greater than the initial force to generate a load curve; decreasing the force on the probe from the maximum force to the initial force to generate an unload curve, the maximum force selected such that the unload curve is independent of the presence of the substrate; and using the unload curve, determining a relationship between (i) the reduced modulus of the sample material and (ii) the ratio of probe penetration depth and the thickness of the layer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022207218-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11461519-B2 |
priorityDate | 2015-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.