| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2207-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2025-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2033-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-3058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-3066 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K25-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-30 |
| filingDate |
2015-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d760458af9ce7d0efa5e7c533c1b6b6f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa3ccbba82d7df64051af9a6ffbd7ad4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cbb1fb7d26be533ae0f4e9f1e30ef8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042ec5a2f96f60daf1810cf55d7b1580
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f1d19dca09b7e6169082268b1a9184e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b66ad45396f07e597d6763bd1a06cde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66ad74d6247eab57f9fedc7e0be99edf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed19b26e0f6ef1c1059e9cf46901425f |
| publicationDate |
2017-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9757895-B2 |
| titleOfInvention |
Patterning method using imprint mold, pattern structure fabricated by the method, and imprinting system |
| abstract |
A patterning method using an imprint mold, to form an imprinted pattern structure, includes providing a resist layer from which the pattern structure will be formed, performing a first imprint process on a first area of the resist layer by using the imprint mold to form a first pattern of the pattern structure through deformation of the resist layer in the first area, and performing a second imprint process on a second area of the resist layer by using the imprint mold to form a second pattern of the pattern structure through deformation of the resist layer in the second area. The first and second areas are overlapped with each other in a third area of the resist layer, and the performing the second imprint process deforms a first portion of the first pattern in the third area to form the second pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11065785-B2 |
| priorityDate |
2014-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |