| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M10-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M10-052 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-483
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-181 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M10-052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M10-05 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-48 |
| filingDate |
2013-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e0b7a6eb6d385b1bd85689047356f2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2258352e4617d8a9e61286b8304d2dda
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bcc8b69f9054ca4b0b27c042d867610
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7b8de06a237b9eb9a42975a7a4ab5cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2abe525bc21760b3d1ad1e6f9cb71216 |
| publicationDate |
2017-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9741462-B2 |
| titleOfInvention |
Method of manufacturing silicon oxide |
| abstract |
Provided is a method of manufacturing silicon oxide by which an amount of oxygen of the silicon oxide may be controlled. The method of manufacturing silicon oxide may include mixing silicon and silicon dioxide to be included in a reaction chamber, depressurizing a pressure of the reaction chamber to obtain a high degree of vacuum while increasing a temperature in the reaction chamber to a reaction temperature, and reacting the mixture of silicon and silicon dioxide in a reducing atmosphere. |
| priorityDate |
2012-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |