| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e528b6f9ef3afd4538cb5a1faef2b7d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C25-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2015-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04275fe4527b7e88943e089e1e8b0748
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b0fea4894822a8ec0730ec5c39e22ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f244f9f4280ccbee8e69769f54da98f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80a07d2f5cafc30343ec292c51dc1d28 |
| publicationDate |
2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9735031-B2 |
| titleOfInvention |
Polishing compositions and methods for polishing cobalt films |
| abstract |
The present disclosure relates to polishing compositions that can polish Cobalt (Co) films in semiconductor substrates containing a multitude of films including Co, metals, metal oxides and dielectrics. These polishing compositions comprise an abrasive, a weak acid acting as a removal rate enhancer (RRE), a pH adjuster, and an azole-containing corrosion inhibitor (CI). The RRE, pH adjuster and CI have a pKa in the 1-18 range (1 (pKa min )<pKa<18 (pKa max )). The pKa values of the individual components are related to the pH of the polishing composition/slurry (pH slurry ) by the following equation: pKa min +6<pH slurry <pKa max −6. The polishing composition also has less than about 100 parts per million (ppm) of sulfate ions and less than about 100 ppm of halide ions, and operates in the 7-12 pH range. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11034861-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10428241-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10808145-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11674056-B2 |
| priorityDate |
2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |