http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9731398-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c85d78c6a4459b5dbbc49c82a4c5c107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fd5e87dcda111840fd72f77cb139e21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7443f9fa412762a1a5ba8390a27fc5e3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate | 2014-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9668049e78be6531ad7ee6dc0664422a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b82da29cce8108c4e84a54fd9b5de200 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bf4cb08f8a958ba5c87ab6d8f981387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e6d2ef2af9f23478d2623b40ba76518 |
| publicationDate | 2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-9731398-B2 |
| titleOfInvention | Polyurethane polishing pad |
| abstract | The polishing pad is for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a cast polyurethane polymeric material formed from a prepolymer reaction of H 12 MDI/TDI with polytetramethylene ether glycol to form an isocyanate-terminated reaction product. The isocyanate-terminated reaction product has 8.95 to 9.25 weight percent unreacted NCO and has an NH 2 to NCO stoichiometric ratio of 102 to 109 percent. The isocyanate-terminated reaction product is cured with a 4,4′-methylenebis(2-chlororaniline) curative agent. The cast polyurethane polymeric material, as measured in a non-porous state, having a shear storage modulus, G′ of 250 to 350 MPa as measured with a torsion fixture at 30° C. and 40° C. and a shear loss modulus, G″ of 25 to 30 MPa as measured with a torsion fixture at 40° C. The polishing pad having a porosity of 20 to 50 percent by volume and a density of 0.60 to 0.95 g/cm 3 . |
| priorityDate | 2014-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.