| abstract |
The present invention relates to a nail polish composition comprising: at least one high gloss film forming agent chosen from a styrene maleic anhydride copolymer; at least one co-film forming agent chosen from an epoxy resin; at least one reactive agent chosen from a combination of a polyalkyleneamine and a polyurethane, at least one polyalkyleneamine, and at least one alkoxysilane comprising at least one solubilizing functional group; at least one solvent chosen from at least one volatile solvent and water; optionally, at least one plasticizer; and optionally, at least one colorant, wherein the composition does not require use of nitrocellulose and can be used to makeup or protect nails. |