Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1e0fc105cdaa6fc6208bcc48eadab50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-2232 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-1643 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-008 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-23 |
filingDate |
2016-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e435798b1e40c09a9773b44f2dbdc21f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_783ea012c10fe36942d571cc6aca9670 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d24a8ca0e100fd3313f14c1647de29ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f566197e2cafe6115985b12dd8a6ecc |
publicationDate |
2017-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9686846-B2 |
titleOfInvention |
Extreme UV radiation light source device |
abstract |
An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation. |
priorityDate |
2013-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |