http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9657123-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d37147a1eebc1b4c794a203b6f0da7e5 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-10 |
| filingDate | 2015-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef2546ab35f4af1c2c07fdcf2fe98855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e397a97ab9d407cda1f5bbe416b72b5a |
| publicationDate | 2017-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-9657123-B2 |
| titleOfInvention | Photoresist compositions and method of preparing the same |
| abstract | The present invention provides a photoresist composition and a method of preparing the same. The photoresist composition includes a color polymer that is obtained by dye molecules grafted to a polymer molecule through chemical bonds. The photoresist composition utilizes the color polymer to replace conventional pigments to preclude conventional problems of difficult to disperse pigments in the photoresist composition, poor contrast and brightness. Since the color polymer has brilliant color, high penetration, good thermal and light stabilities, so that the photoresist composition of the present invention has better color developing effect, preferred thermal and light stabilities. The present invention provides a method of preparing a photoresist composition which reduces components in the photoresist composition and simplifies preparation process of the photoresist composition, the photoresist composition obtained thereby has better color developing effect, also has preferred thermal and light stabilities. |
| priorityDate | 2014-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 175.