| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bdc984faac0fcd2eb4aa46a8be3f35f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c7edf5889c86ba999c55da80488fa7cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bcc975684800f38fb6724bea856cd124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dd931ca45457a3f9480bb4170b7102f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2038403cc6d89433a762ba129769863b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68735
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68714
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 |
| filingDate |
2011-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ee0a4181a72dba09dfad6262f13e7b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8621040c4471663f91c9ea1bfdbd347e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa7420c334fc9f8b1cc8ea571df03549
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a16d7eb51a71b5a9956c0c3a4b53b95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5a6edce2a60fd30d648347f77a022a3 |
| publicationDate |
2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9650726-B2 |
| titleOfInvention |
Methods and apparatus for deposition processes |
| abstract |
Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10731272-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9941119-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11651990-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019257000-A1 |
| priorityDate |
2010-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |