| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B2210-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-0683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J4-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-211 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J4-04 |
| filingDate |
2016-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d83e5230841f9abd4709aa029e291a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52e716d8761c78a685583b6732ade875
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4349db42244264cb8c0cf42703e525a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e596833f53b0575fdaa12e9ce3a8717
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0688172562ef997d3aa0cc528b823aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d5397927af70e97f72c3a34deadda2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13ed87c7fb6219041e6bd5b5afa36fef |
| publicationDate |
2017-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9574992-B1 |
| titleOfInvention |
Single wavelength ellipsometry with improved spot size capability |
| abstract |
Methods and systems for performing single wavelength ellipsometry (SWE) measurements with reduced measurement spot size are presented herein. In one aspect, a pupil stop is located at or near a pupil plane in the collection optical path to reduce sensitivity to target edge diffraction effects. In another aspect, a field stop is located at or near an image plane conjugate to the wafer plane in the collection optical path to reduce sensitivity to undesired optical-structural interactions. In another aspect, a linear polarizer acting on the input beam of the SWE system includes a thin, nanoparticle based polarizer element. The nanoparticle based polarizer element improves illumination beam quality and reduces astigmatism on the wafer plane. The pupil and field stops filter out unwanted light rays before reaching the detector. As a result, measurement spot size is reduced and tool-to-tool matching performance for small measurement targets is greatly enhanced. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020125904-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200132572-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111948236-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11143555-B2 |
| priorityDate |
2016-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |