Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49815 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B43-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4557 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05B1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B43-00 |
filingDate |
2014-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0d32419fc2611a5741f134ea0b52217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2245c87837d400259992de4164c047b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c63c0bd756fa180af4547ab7d7d03dc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6a96e822cca8a6563d3fe23a2e4566d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69193aabd3338ed29efd1ae60b042ae2 |
publicationDate |
2017-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9570275-B2 |
titleOfInvention |
Heated showerhead assembly |
abstract |
The present disclosure generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber. When processing gas is evacuated from the processing chamber, the uniform processing of the substrate may be difficult. As the processing gas is pulled away from the substrate and towards the vacuum pump, the plasma, in the case of etching, may not be uniform across the substrate. Uneven plasma may lead to uneven etching. To prevent uneven etching, the showerhead assembly may be separated into two zones each having independently controllable gas introduction and temperature control. The first zone corresponds to the perimeter of the substrate while the second zone corresponds to the center of the substrate. By independently controlling the temperature and the gas flow through the showerhead zones, etching uniformity of the substrate may be increased. |
priorityDate |
2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |