| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_42047e47d2f0f47bfcb3f61a4ac48c9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_159d8a52e7d439ce2ddf23b2c0e252cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_108fbf1d88b0d71e1e8fbf39ff2a1932
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-21 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30 |
| filingDate |
2011-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cca06623a1bdd9799e041eb8bf40845c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dc5498ce8c8432b3d2e90bb784c5d00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_202dac055d2eaa40992fa54212740b28 |
| publicationDate |
2017-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9535013-B2 |
| titleOfInvention |
Method and apparatus for inspecting defect |
| abstract |
In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019013225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10763147-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11240441-B2 |
| priorityDate |
2010-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |