| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_295381610bde42dd717c3bf868b9c41a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed54a3c9a3d344f4c9580820c45c654a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2483-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-269 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-06 |
| filingDate |
2008-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48e8a42b2906325872be12eba7157a95 |
| publicationDate |
2017-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9533327-B2 |
| titleOfInvention |
Transparent resin plate and a method for producing the same |
| abstract |
A transparent resin plate superior in quality and productivity and a method for producing the same by forming a hard-coat layer on a substrate into a hardened film and by establishing a reforming method thereof are disclosed. The transparent resin plate has a substrate ( 1 ), a primer layer ( 2 ) and a hard-coating layer ( 3 ) in order, wherein the primer layer ( 2 ) is formed by a wet method, the hard-coating layer ( 3 ) is formed out of silicone polymer by the wet method, the surface of the silicone polymer layer is exposed to irradiation by ultraviolet light having a wavelength less than 200 nm, and only the exposed region is changed into a reformed region mainly composed of silicon dioxide. |
| priorityDate |
2008-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |