| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-02 |
| filingDate |
2015-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8ae8ecc6b09a2801e360082613990ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db9c7b3e46977809b78ebc252e416587
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54a36a122b4a33096e06196f0e8efd34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d791955ecf121049a468c8405520395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8285b1cd4cebc4a75ba067c9e5d0a6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9870e33cdcfa7bac7e020b0b3c104a4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12e232966224008f8d2a4c5f7aa5b9bf |
| publicationDate |
2016-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9507255-B2 |
| titleOfInvention |
Methods of manufacturing integrated circuit devices by using photomask cleaning compositions |
| abstract |
In a method of manufacturing an integrated circuit (IC) device, a photomask is wet-processed using a cleaning composition comprising an organic acid, an oxidizing agent, and deionized water (DIW). |
| priorityDate |
2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |