| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28512 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45576
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45582
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2014-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e910b7c8ac8aadb58b3aa978d1308efb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4f6f10e480bb3d7877b890f61ea8d04 |
| publicationDate |
2016-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9502237-B2 |
| titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium |
| abstract |
Provided are a substrate processing apparatus, a method of manufacturing a semiconductor device and a non-transitory computer-readable recording medium. The substrate processing apparatus includes a process chamber configured to process a substrate; a gas supply unit including gas supply holes configured to independently supply a process gas for processing the substrate to each of a central portion of the substrate and a peripheral portion of the substrate in the process chamber; an exhaust unit configured to exhaust an inside of the process chamber; and a control unit configured to control the gas supply unit to supply the process gas to the central portion of the substrate after the process gas is supplied to the peripheral portion of the substrate through the gas supply unit. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903053-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10557198-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10395900-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11554329-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10456709-B2 |
| priorityDate |
2013-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |