| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0514 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_897495346d2d632e4f5c9e29b395c607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9934d76f5c383f53db84f9b59d623b78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93e20e1d1a48457ac57d5f2136fbc136 |
| publicationDate |
2016-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9448478-B2 |
| titleOfInvention |
Chemically amplified positive-type photosensitive resin composition for thick-film application |
| abstract |
A chemically amplified positive-type photosensitive resin composition for thick-film application capable of forming a resist pattern having a nonresist section with a good rectangular cross-sectional shape under a low exposure level even when a resist pattern having a film thickness of 10 μm or more is formed. A chemically amplified positive-type photosensitive resin composition for thick-film application comprising an acid generator and an organic solvent, in which an acrylic resin is added that contains a constituent unit derived from an acrylic acid ester comprising an —SO 2 -containing cyclic group or a lactone-containing cyclic group as a resin whose solubility in alkali increases under the action of acid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9977328-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016231651-A1 |
| priorityDate |
2014-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |