| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d0a3d10ed9477633fd2c07c6da61dc49 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2005-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1857
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1838 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K7-10 |
| filingDate |
2013-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbe8bc1a18e4bc5e3057431f316ebe19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c65df24317b3f7f159edd90351144e8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e8d75a40af57fef8e878787bab45a34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43104c0508df98c0cc90727459b3db68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4caa17a485e038c2741c927cb93e735f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79860f519813152f97b5ef5ad86e6e45 |
| publicationDate |
2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9442230-B2 |
| titleOfInvention |
Sub-wavelength extreme ultraviolet metal transmission grating and manufacturing method thereof |
| abstract |
A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns. |
| priorityDate |
2011-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |