http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9442077-B2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-20061 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T5-002 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 |
filingDate | 2014-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b4c19c60eaabcd0beb12abad5aeddea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5c3a4ed38a4038c4d3f7cd100765339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8842078847a5bc45e774d0638edaa1cf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30d2a5c992786857e9e224ba4841dea4 |
publicationDate | 2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-9442077-B2 |
titleOfInvention | Scratch filter for wafer inspection |
abstract | Methods and systems for filtering scratches from wafer inspection results are provided. One method includes generating a defect candidate map that includes image data for potential defect candidates as a function of position on the wafer and removing noise from the defect candidate map to generate a filtered defect candidate map. The method also includes determining one or more characteristics of the potential defect candidates based on portions of the filtered defect candidate map corresponding to the potential defect candidates. In addition, the method includes determining if each of the potential defect candidates are scratches based on the one or more characteristics determined for each of the potential defect candidates and separating the potential defect candidates determined to be the scratches from other defects in inspection results for the wafer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10489902-B2 |
priorityDate | 2013-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.