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filingDate 2012-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9418771-B2
titleOfInvention Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing same
abstract The present invention provides a complex oxide sintered body 10 wherein Zr/(In+Zr+Y) is 0.05 to 4.5 at % and Y/(In+Zr+Y) is 0.005 to 0.5 at % in an atomic ratio when indium, zirconium, and yttrium are designated by In, Zr, and Y, respectively. Moreover, the present invention provides a sputtering target including the complex oxide sintered body 10 and a transparent conductive oxide film obtained by sputtering the sputtering target.
priorityDate 2011-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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