| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37dbd377904f1541a23d77a2edca2495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e7356ce5d92e9e81ad32980f3aa86bbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbe7e532aa4b031076bd767e8b918f1c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_265e1bc9f754515df2d21bcbbd9dc58a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-52 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-3653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G23-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-22 |
| filingDate |
2012-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eef104bf8b17ab8590743f4d6c47e11f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8eba258387e5735087e35752ac9d05d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afdf722f86e87138159e1a7bb48d1305 |
| publicationDate |
2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9416246-B2 |
| titleOfInvention |
Process for controlling particle size and silica coverage in the preparation of titanium dioxide |
| abstract |
The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid silicon halide and liquid titanium dioxide precursor into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200° C. to about 1600° C. to produce titanium dioxide particles that are substantially encapsulated in silicon dioxide. |
| priorityDate |
2011-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |