| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B6-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02359
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B6-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2014-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4674d2edacbf113d943eb17c46c963d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a14ce8af59f81f1b1bf397dd74a8be8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5671ed060e02752c6f50d1c42fdc349 |
| publicationDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9414445-B2 |
| titleOfInvention |
Method and apparatus for microwave treatment of dielectric films |
| abstract |
A method for processing a dielectric film on a substrate comprises: depositing a porous dielectric film on a substrate; removing the porogen; stuffing the film with a protective polymeric material; performing at least one intermediate processing step on the stuffed dielectric film; placing the film in a microwave applicator cavity and heating to a first temperature to partially burn out the polymeric material; introducing a controlled amount of a polar solvent into the porosity created by the partial burn out; applying microwave energy to heat the film to a second selected temperature below the boiling point of the solvent to clean away remaining polymeric material; and applying microwave energy to heat the film to a third temperature above the boiling point of the solvent to completely burnout the residues of polymeric material. The interaction of the polar solvent with the microwaves enhances the efficiency of the cleaning process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10790135-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190045071-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190046638-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190051852-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11495490-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200117960-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180105579-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10446438-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10910259-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325780-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879060-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10629448-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10840084-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180011000-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180065925-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10755971-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180111560-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11056349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190070859-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210131928-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10593556-B2 |
| priorityDate |
2013-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |