| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20f12ab58e48cba76595b376f1a15326 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L35-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N19-101 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N10-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L35-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N10-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N10-851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L35-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J5-0853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L35-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L35-04 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L35-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0232 |
| filingDate |
2014-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb7d3d76a14aa530a453535a8eeeb8dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea87c1dc169df9ff2cc75f0b58e8e311 |
| publicationDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9412927-B2 |
| titleOfInvention |
Formation of a thermopile sensor utilizing CMOS fabrication techniques |
| abstract |
Techniques are described to form an absorption stack proximate to a thermopile sensor. In one or more implementations, a thermopile sensor is formed proximate to a semiconductor wafer. An absorption stack is formed proximate to the semiconductor wafer and includes a first layer, a second layer, and a third layer. The first layer may be a material having absorption and/or reflective characteristics. The second layer may be a material having wave phase shift characteristic characteristics. The third layer may be a material having a reflective characteristic. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016282194-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9917242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10876903-B2 |
| priorityDate |
2014-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |