| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02573
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4583
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4558
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2012-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b36986f837e5fbc816e4ef1bb4781ed9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2210e489ed4f14ee0fd85948dcd85bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f77722f6ee20b1d44b598261f98a098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_857c177c59f44d3bcff641bbb271c5cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d7611c51e8cde590332b7172c4ff9d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cc6aeb546cf8cbedbbfe9d5d8590793 |
| publicationDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9410247-B2 |
| titleOfInvention |
Chemical vapor deposition apparatus |
| abstract |
A chemical vapor deposition apparatus can include a reaction chamber having a reaction space therein; a wafer boat disposed in the reaction space, the wafer boat arranged and structured to support a plurality of wafers; and a gas supplying part disposed in the reaction chamber to supply two or more reaction gases to the plurality of wafers. The gas supplying part can include a plurality of gas pipes disposed in the reaction chamber to supply the two or more reaction gases from outside to the reaction space; and a plurality of supplying pipes disposed around the wafer boat, wherein each of the supplying pipes is connected to two or more corresponding gas pipes, and wherein each supplying pipe is configured to supply the two or more reaction gases supplied by the two or more corresponding gas pipes to a corresponding one of the wafers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014345801-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015013909-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10971646-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9593415-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10475641-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10337103-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10655223-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10208380-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021054507-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020035852-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9620395-B2 |
| priorityDate |
2011-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |