| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 |
| filingDate |
2014-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cb69013e1dbc9dcaa9f54644d0b333e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321716bdc453730997ce6512290c4369
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_621bef7a50be53975302bca186df992e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eaeced56dc0fd546792086051736aab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb995af52b6a2d5d793e0c569c2e8898 |
| publicationDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9384980-B2 |
| titleOfInvention |
Manufacturing method of semiconductor device |
| abstract |
According to an embodiment, a manufacturing method of a semiconductor device includes: forming a first film on a processing target by using a first material; forming a second film on the first film by using a second material; selectively removing the second and first films to provide an opening pierced in the second and first films; selectively forming a metal film on an inner surface of the opening in the first film; and processing the processing target by using the metal film as a mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015001723-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10510655-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264321-B2 |
| priorityDate |
2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |