Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2a3bb4ae410da4be8184239adc5ab1c0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
filingDate |
2013-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b3df1309d74708361588eb76e0a45ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81208d13e5a1e809c713fbcc4532c0dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eacce6bc739f506a6e75b3ff36f7f623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29c9d092bce9944a72cdb9f313d37499 |
publicationDate |
2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9382615-B2 |
titleOfInvention |
Vapor deposition of LiF thin films |
abstract |
A vapor deposition process for forming a thin film on a substrate in a reaction chamber where the process includes contacting the substrate with a fluoride precursor. The process results in the formation of a lithium fluoride thin film. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016369397-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9909211-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11326255-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11111578-B1 |
priorityDate |
2012-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |