Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ce870ccd2ac38466b26e8df989f2b342 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-0464 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F4-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F4-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F4-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-003 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F4-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2014-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa966630799fae706cd1b08d7bcc5908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_173020b00b332e654d53de2f69be1972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_122e89032363092c4147607690193510 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11fc0710511c030d4ff9895b947e93ae |
publicationDate |
2016-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9366960-B2 |
titleOfInvention |
Negative resist composition, method of forming resist pattern, and complex |
abstract |
A negative resist composition including a complex represented by the general formula (1); and a polymerization initiator. in which M represents hafnium (Hf) or zirconium (Zr), X represents a ligand including a conjugate base of an acid which has an acid dissociation constant (pKa) of 3.8 or less and has a polymerizable group, Y represents a ligand having no polymerizable group, and n represents an integer of 1 to 4.n n[MX n Y 4-n ] (1) |
priorityDate |
2013-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |