| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06K9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-06113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-20081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2201-068 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-95607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-00 |
| filingDate |
2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a776db4004d716dd7acb40aa31988437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d855097e2516d32db576cf0b268b8669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccd4aeb2e7f35bf147d9461722d8e6c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30d2a5c992786857e9e224ba4841dea4 |
| publicationDate |
2016-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9310320-B2 |
| titleOfInvention |
Based sampling and binning for yield critical defects |
| abstract |
Methods and systems for design based sampling and binning for yield critical defects are provided. One method includes aligning each image patch in each inspection image frame generated for a wafer by an optical subsystem of an inspection system to design information for the wafer. The method also includes deriving multiple layer design attributes at locations of defects detected in the image patches. In addition, the method includes building a decision tree with the multiple layer design attributes. The decision tree is used to separate the defects into bins with different yield impacts on a device being formed on the wafer. The method also includes binning the defects with the decision tree. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11728192-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10204290-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10073444-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10488347-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017083009-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10304177-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018107903-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018005367-A1 |
| priorityDate |
2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |