| abstract |
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R 1 and R 4 each independently represent a hydrogen atom, or the like. R 2 and R 3 each independently represent a hydrogen atom or the like. X 1 and X 2 each independently represent a hydrogen atom, or the like, or X 1 and X 2 taken together represent —S—, —O—, —SO 2 —, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X 1 , X 2 and A is substituted by —Y—SO 3 − M + . Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. M + represents a monovalent onium cation. In the case where —Y—SO 3 − M + is present in a plurality of number, a plurality of Ys are each identical or different and a plurality of M + s are each identical or different. |