| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 |
| filingDate |
2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1e4d3f4c43cf2fc4e360518a7160f2d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c07d9947b60ca642c4ad6539eb479331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6798562f113efe966e272fcc76278b24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b467b0182e1868d9174e3c555ddb194
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6296e7e16bbaac62b24cbed4c34cff40 |
| publicationDate |
2016-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9298083-B2 |
| titleOfInvention |
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof |
| abstract |
An extreme ultraviolet photomask comprises a reflective layer over a substrate, a capping layer over the reflective layer, a hard mask layer over the capping layer, and an absorber. The absorber is in the hard mask layer, the capping layer and the reflective layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11358975-B2 |
| priorityDate |
2010-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |