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filingDate 2013-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe035bf4c982fd04dbbc61823ce81753
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publicationDate 2016-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9290410-B2
titleOfInvention Method for sludge control in wet acid etching
abstract The disclosure is directed to a method for controlling the sludge that is generated during the wet acid etching of glass articles. The four Factors that need to be controlled are (i) the dissolved glass level A; (ii) the HF concentration B; (iii) the second acid concentration C, the second acid being a strong acid, and (iv) the solubility constant D of the precipitate, Ksp, which is controlled by changing temperature or ionic strength. The disclosed method utilized HF as the etchant and a strong acid selected from the group consisting of HCI, H 2 SO 4 .HNO 3 and HCIO 4 .
priorityDate 2012-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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