Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5e4671b3ba1fd59502c47747a80896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9573516d4aff6a63ab33cf32232a19fa |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70925 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70958 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y10-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-02 |
filingDate |
2011-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_770ce17a172b42d67422808c7b057bc6 |
publicationDate |
2016-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9274441-B2 |
titleOfInvention |
Inspection method for imprint lithography and apparatus therefor |
abstract |
A method is disclosed for inspecting a device imprint lithography template to detect defect particles of imprintable medium remaining on the patterned imprinting surface after an earlier imprint step. The method involves illuminating the patterned surface with radiation of a first wavelength selected to induce fluorescence of the defect particles and not to induce fluorescence of anti-adhesion compound on the patterned surface. The presence of defect particles is indicated by the presence of fluorescence from the patterned surface and can be used to initiate a cleaning step when necessary, speeding processing by eliminating unnecessary cleaning. The elimination of false positives from transferred anti-adhesion compound is reduced or eliminated. Related apparatus is also disclosed. |
priorityDate |
2010-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |