| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-103 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-267
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-282 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B7-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D39-00 |
| filingDate |
2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18443fb56f0942e465bb1a21b5af20fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfe58e5ebbbfe04cb962e57902f7c4e2 |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9259668-B2 |
| titleOfInvention |
Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate |
| abstract |
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid. |
| priorityDate |
2012-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |