| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-125 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F1-442 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate |
2014-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbf15733f1279209c23e17a8af185e06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c303d9b95283c315c9ebf26107ffd51b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2671157307e2ea5c6dabb87bb78ae0b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64c5ed938eadf96e074327e9d04a5f5f |
| publicationDate |
2015-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9226405-B1 |
| titleOfInvention |
Magnetically controllable fluidic etching process |
| abstract |
The method includes applying a magnetic etching ferrofluid, that contains an aqueous etchant solution within one or more reverse micelles responsive to a magnetic field, onto the substrate at a first depth. The method also includes creating a magnetic field at a first strength that causes the reverse micelle to move in a first direction at a first rate. The method also includes determining whether the substrate is at a second depth. The method also includes reducing, in response to the substrate being at a second depth, the magnetic field to a second strength to cause the reverse micelle to move in the first direction at a second rate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114760765-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114760765-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106277811-A |
| priorityDate |
2014-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |