| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_acef3563199a09e567008a3ff45f8ca7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f8868f30d11ece2d2c09d78eb63077f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93bd50d3f1b6ab5b432ce10a8f57610b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8e66f4ed85b71be8b923a54730c1de |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F-
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83ccb5efdf6ef5a36f6df1a25671f1d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba6a6cf567e198e95b24ec45eede310c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cde5119c23dc723dfcdeb82c09fb94a |
| publicationDate |
2015-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9207538-B2 |
| titleOfInvention |
Applications of semiconductor nano-sized particles for photolithography |
| abstract |
Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described. |
| priorityDate |
2003-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |