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publicationNumber US-9147842-B2
titleOfInvention Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same
abstract A highly fluorinated photoresist employing a photodimerization chemistry and a method for manufacturing an organic light emitting diode display using the same. The photoresist includes a copolymer that is made from two different monomers. When the copolymer is used as a photoresist, the photoresist has the characteristic that it becomes insoluble when exposed to an ultraviolet light having a wavelength of 365 nm.
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