http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9102040-B2

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c2c656781bbe12aea668916f29ebd18d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a852eab7332531050034b1e42634d12d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
filingDate 2011-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4cbefdb528c847e078020ebd683d2a8
publicationDate 2015-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9102040-B2
titleOfInvention Low free formaldehyde phenolic resins for abrasive products
abstract The present invention provides process for the manufacture of an aqueous resin composition comprising a phenolic formaldehyde (PF) resin, which process comprises the steps of providing a formaldehyde and phenolic compound, reacting the compounds in a condensation reaction in the presence of a catalyst, after completion of the condensation reaction to react with free formaldehyde, determining the free formaldehyde content of the resin composition, adding a pre-calculated substantially stoichiometric amount of modifying compound containing a primary amine group to reduce the amount of free formaldehyde in the resin composition to less than 0.1 wt % (relative to the total weight of the aqueous resin composition), and optionally distillation of the reaction product.
priorityDate 2010-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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